Preliminary survey report, control technology for integrated circuit fabrication, Micro-Circuit Engineering, Inc., West Palm Beach, Florida.
Public Domain
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1984/07/03
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Description:A survey to assess control technology for integrated circuit fabrication was conducted at Microcircuit Engineering, Incorporated (SIC-3674), West Palm Beach, Florida, in December 1981. Engineering controls included local and general exhaust ventilation, shielding, and personal protective equipment. Devices or work stations that contained toxic materials that were potentially dangerous were controlled by local exhaust ventilation. Less hazardous areas were controlled by general exhaust ventilation. Process isolation was used in the plasma etching, low pressure chemical vapor deposition, and metalization operations. Shielding was used in ion implantation units to control X-ray emissions, in contact mask aligners to limit ultraviolet (UV) emissions, and in plasma etching units to control radiofrequency and UV emissions. Most operations were automated. Use of personal protective equipment varied by job function. Heat protective gloves were required during vapor deposition, and goggles, face shields, gloves, and aprons were required when handling chemical solutions. No gas monitoring was observed. Recommendations include installation of a combustible gas monitoring system and preplacement and periodic medical examinations. [Description provided by NIOSH]
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Content Notes:in NTRL, no pdf
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Pages in Document:1-23
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NIOSHTIC Number:nn:00135192
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NTIS Accession Number:PB85100717
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Citation:Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, ECTB 115-22a, 1984 Jul; :1-23
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Federal Fiscal Year:1984
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Peer Reviewed:False
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Source Full Name:National Institute for Occupational Safety and Health
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Main Document Checksum:urn:sha-512:7dc847c09aedf140bc731323e8446b4703641ae07d6ad9e7b7238120dab30b8f7dcaa9b938d34d035f87873a0fe7fec262d5d13dcaf290925445e82b6de3b57d
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