In-depth survey report: control technology for the microelectronics industry at Fairchild Semiconductor, South Portland, Maine.
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1984/08/01
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Description:This in depth survey was conducted as part of a larger data gathering effort to characterize basic exposures and describe the processes and controls in place within the microelectronic industry. The Fairchild Semiconductor facility (SIC-3674) located at South Portland, Maine, was selected for study. Six operations were considered: photolithography, wet chemical etching, diffusion doping, ion implantation, operations using radio frequency radiation, and gas handling and distribution systems. Most of the chemical handling tasks involved the movement of process chemicals from storage or holding areas into the circuit fabrication process area. Worker exposure during the transfer of liquid chemicals was controlled through the use of personal protective equipment. Worker exposures to organic substances from photolithographic operations in both the old and the new technology tunnels proved to be less than the threshold limit values for these substances. However, the new equipment appeared to provide a five fold reduction in workplace exposure. Among the diffusion furnace operators, emissions of boron (7440428) compounds were detected in personal and area samples. Under some circumstances the removal of wafer boats combined with the down draft of air from overhead HEPA filters could cause a reduced effectiveness of the scavenger box exhaust. As for radiation exposure, the dosimetry data indicate that the shielding greatly attenuated the level of X-ray emissions that reach the workplace. Emission due to the magnetic and electrical fields for 450 kilohertz sources were below the recommended limits.
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Pages in Document:1-89
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NIOSHTIC Number:nn:00236849
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Citation:Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, ECTB 115-20b, 1984 Aug; :1-89
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Federal Fiscal Year:1984
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Peer Reviewed:False
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Main Document Checksum:urn:sha-512:97f45ec099858bd35d279c060fdad2d30dfb62cea69314fc8112f602167a34086e8c029cc7e7ea5687be7f56295234a43c155fef873209706910f3210cc90074
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