In-depth survey report: control technology for the microelectronics industry at United Technologies Corporation's Mostek Facility, Carrollton, Texas.

Details

• Personal Author:
  Jones JH ; Smith RK ; Ungers LJ
• Description:
  An in depth survey was performed at United Technologies Corporation MOSTEK facility (SIC-3674) located in Carrollton, Texas, as part of a larger effort to characterize basic exposures and describe the processes and controls so that an assessment can be made of the hazard control technology used within the microelectronic industry. Six operations were studied in detail, including wet chemical stations, diffusion, ion implantation, radio frequency, radiation sources, and gas handling and distribution systems. The chemical handling tasks at the company offered an example of good contemporary engineering design incorporating exhausted gas cabinets for safe storage of gas cylinders, flow limiting valves, solenoid valves for emergency shutdown, and welded stainless steel lines that contain a minimum of compression fittings. Personal protective equipment was heavily used. Monitoring of hydrofluoric-acid (7664393) exposure showed that no exposure hazard existed at the wet chemical station. Phosphate emissions were detected at the diffusion furnace using phosphorus-oxychloride as a dopant. While exposures to emissions of toxic dopants were below current recommended standards, the ventilation controls on both cassette and palette type ion implanters did not completely eliminate worker exposure as had been previously thought. Measurements also indicated that it was unlikely that significant exposures to radio frequency radiation would occur.
• Subjects:
  Accidents, Occupational Noise Occupational Health Safety
• Keywords:
  Acid-mists Control-technology Electronics-industry Field-Study NIOSH-Author NIOSH-Survey Personal-protective-equipment Radiation-exposure Region-6 Semiconductors Ventilation-systems

  More +
• DOI:
  https://doi.org/10.26616/NIOSHECTB11516b
• Publisher:
  National Institute for Occupational Safety and Health
• Document Type:
  Text
• Genre:
  Field Studies ; Control Technology
• Place as Subject:
  Ohio ; OSHA Region 5 ; OSHA Region 6 ; Texas
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Division:
  DPSE - Division of Physical Sciences and Engineering
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Pages in Document:
  1-59
• NIOSHTIC Number:
  nn:00236843
• Citation:
  Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, ECTB 115-16b, 1984 Aug; :1-59
• CAS Registry Number:
  Hydrofluoric acid (CAS RN 7664-39-3)
• Federal Fiscal Year:
  1984
• Peer Reviewed:
  False
• NAICS and SIC Codes:
  3674 - Semiconductors and related devices - (SIC)
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:36a454b2cd518e5b40d4a97f50f9e1f3f6b0fe89629b67dc86d1347e6483905fb792a41531b4392e6ff22866f882b8a7993145ae485c0923851c54f000ffbf55
• Download URL:
  https://stacks.cdc.gov/view/cdc/180965/cdc_180965_DS1.pdf
• File Type:
  [PDF - 1.24 MB ]