Preliminary survey report: control technology for gallium arsenide processing at Honeywell, Inc., Richardson, Texas.

Details

• Personal Author:
  Lenihan KL
• Description:
  An evaluation was made of control technology at Honeywell, Inc., (SIC-3674) in Richardson, Texas, which was primarily involved in gallium-arsenide (1303000) wafer fabrication involving about 70 workers. Major hazards were potential chemical exposures to solvents, acids, and gases. Solvents and gases used most frequently included silane (7803625), selenium-hexafluoride (7783791), tetraethoxy-silane (78104), 1,2,4-trichlorobenzene (120821), fluorocarbon compounds, xylene (1330207), 1,1,1-trichloroethane (71556), and glycol ethers. Fabrication processes included cleaning and etching prior to silicon-nitride coating and ion implantation, photoresist applications using photolithography, epitaxial reactions for optoelectronic device production, oxidation, and metallization. Honeywell focussed primarily on ventilation for hazard control, including laminar flow hoods and reaction tubes for process isolation, and scrubbers for effluent gases. Continuous hydrogen monitoring was not done. Medical monitoring consisted of quarterly urine tests for arsenic (74403820). Protective clothing and safety goggles were used. Most training was on the job, and monthly safety meetings were held. The author concludes that since this facility does not engage in crystal growth and has no employee with substantial time to spend for health and safety, it is not recommended for inclusion in an in depth survey of gallium-arsenide safety issues.
• Subjects:
  Accidents, Occupational Fatty Acids Occupational Health Safety
• Keywords:
  Arsenic-compounds Dust-control Field-Study NIOSH-Author NIOSH-Survey Region-6 Semiconductors Vapors Ventilation-systems
• DOI:
  https://doi.org/10.26616/NIOSHECTB16317A
• Publisher:
  National Institute for Occupational Safety and Health
• Document Type:
  Text
• Genre:
  Field Studies ; Control Technology
• Place as Subject:
  Ohio ; OSHA Region 5 ; OSHA Region 6 ; Texas
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Division:
  DPSE - Division of Physical Sciences and Engineering
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Pages in Document:
  1-8
• NIOSHTIC Number:
  nn:00177544
• Citation:
  Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, ECTB 163- 17A, 1987 Dec; :1-8
• CAS Registry Number:
  Gallium arsenide (CAS RN 1303-00-0) ; Silane (CAS RN 7803-62-5) ; Selenium hexafluoride (CAS RN 7783-79-1) ; Tetraethoxysilane (CAS RN 78-10-4) ; 1,2,4-Trichlorobenzene (CAS RN 120-82-1) ; Xylene (CAS RN 1330-20-7) ; 1,1,1-Trichloroethane (CAS RN 71-55-6) ; Ethanone, 1-[11-(acetyloxy)-11-hydroxyspiro[dibenz[b,f]oxepin-10(11H),4′-piperidin]-1′-yl]- (CAS RN 74403-82-0)
• Federal Fiscal Year:
  1988
• Peer Reviewed:
  False
• NAICS and SIC Codes:
  3674 - Semiconductors and related devices - (SIC)
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:889fd231f5f9463553b5c3e122477007af883b71fcc224534ce9d8c209125b847dd9ae4a92e6127195c3f3d9214c2b3cc2fdbfb7ab25ad5370e03c198531d674
• Download URL:
  https://stacks.cdc.gov/view/cdc/180045/cdc_180045_DS1.pdf
• File Type:
  [PDF - 338.54 KB ]