Preliminary control technology survey report, Micro Power Systems, Inc., Santa Clara, California.

Details

• Personal Author:
  Mihlan GJ ; Willson RD
• Description:
  A survey to assess control technology was conducted at Micro Power Systems, Incorporated (SIC-3674), Santa Clara, California, in January, 1982. Engineering controls included isolation, shielding, and local exhaust ventilation. Isolation was used in plasma etching, ion implantation, chemical vapor deposition, epitaxial silicon deposition, and metalization processes. Shielding was used in the ion implantation units to limit X-ray emissions, in plasma etching and epitaxial silicon deposition to control radiofrequency radiation emissions, and in substrate exposure to limit ultraviolet emissions. Local exhaust ventilation was used in wet chemical cleaning and etching, in photolithography processes, and in the diffusion furnaces. The electron beam evaporation, direct current sputtering, plasma etching, ion implantation, and chemical vapor and epitaxial silicon deposition processes were automated. Personal protective equipment used included safety glasses, face shields, acid resistant coveralls, and gloves. The facility had a health and safety program that included worker training in safety, materials handling, personal protective equipment, and hazard reporting. The facility retained consultants in industrial hygiene, safety, and health care. Recommendations include establishing a program of preplacement and periodic medical examinations and evaluation of the ability of the ventilation system to control chromic-acid (7738945), phenol (108952), and antimony-trioxide (1309644).
• Subjects:
  Accidents, Occupational Biochemistry Manufacturing And Industrial Facilities Occupational Health Paint Safety Workplace
• Keywords:
  Control-technology Electronics-industry Field-Study Industrial-chemicals Industrial-engineering NIOSH-Author NIOSH-Survey Occupational-safety-programs Region-9 Ultraviolet-light Work-practices X-ray-absorption

  More +
• DOI:
  https://doi.org/10.26616/NIOSHECTB11526a
• Publisher:
  National Institute for Occupational Safety and Health
• Document Type:
  Text
• Genre:
  Field Studies ; Control Technology
• Place as Subject:
  California ; Ohio ; OSHA Region 5 ; OSHA Region 9
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Division:
  DPSE - Division of Physical Sciences and Engineering
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Pages in Document:
  1-31
• NIOSHTIC Number:
  nn:00135190
• Citation:
  Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, ECTB 115-26a, 1984 Jul; :1-31
• CAS Registry Number:
  Chromic acid (H2CrO4) (CAS RN 7738-94-5) ; Phenol (CAS RN 108-95-2) ; Antimony trioxide (CAS RN 1309-64-4)
• Federal Fiscal Year:
  1984
• Peer Reviewed:
  False
• NAICS and SIC Codes:
  3674 - Semiconductors and related devices - (SIC)
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:10181ad74dfd5d4c25dd58186d2368ad8574af10302ba1985e0b44264a3f5c7e29e0e744ecf8545f1f2f65ea5205c97ed9c56f398bcee2a4d399b47df74c3bd3
• Download URL:
  https://stacks.cdc.gov/view/cdc/179670/cdc_179670_DS1.pdf
• File Type:
  [PDF - 1.24 MB ]