Preliminary control technology survey report, Rockwell International Corporation, Electronic Devices Division, Newport Beach, California.

Details

• Personal Author:
  Mihlan GJ ; Willson RD
• Description:
  A control technology survey was conducted at the electronics devices division of Rockwell International Corporation (SIC-3674), Newport Beach, California, in January, 1982. Engineering controls included isolation, shielding, and local exhaust ventilation. Isolation was used in plasma etching, ion implantation, low pressure chemical vapor deposition, metalization, and wet chemical etching and stripping operations. Shielding was used in ion implantation to limit X-ray emissions, in plasma etching and radiofrequency sputtering to control emissions, and in substrate exposure to control ultraviolet emissions. Local exhaust ventilation was used in wet chemical cleaning and etching, diffusion, thermal oxidation operations, and in the gas storage cabinets. Most operations were automated. Continuous area monitoring for phosphine (7803512) was conducted. Personal protective equipment used included smocks, safety glasses, head covers, and protective shoes. Operators at wet chemical stations were required to wear acid resistant aprons, gloves, and face shields. The facility employed consultants in industrial hygiene. The authors note that the facility does not have a combustible gas monitoring system. Recommendations include installing a combustible gas monitoring system and substitution of silicon-tetrafluoride (7783611) in the plasma etching process with a less toxic substance.
• Subjects:
  Accidents, Occupational Hazardous Substances Manufacturing And Industrial Facilities Occupational Health Pathology Plastics Safety
• Keywords:
  Combustible-gases Control-technology Electronics-industry Field-Study Fluoride-compounds Industrial-chemicals Industrial-engineering NIOSH-Author NIOSH-Survey Radio-waves Region-9 Silicon-compounds Ultraviolet-light

  More +
• DOI:
  https://doi.org/10.26616/NIOSHECTB11528a
• Publisher:
  National Institute for Occupational Safety and Health
• Document Type:
  Text
• Genre:
  Field Studies ; Control Technology
• Place as Subject:
  California ; Ohio ; OSHA Region 5 ; OSHA Region 9
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Division:
  DPSE - Division of Physical Sciences and Engineering
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Pages in Document:
  1-31
• NIOSHTIC Number:
  nn:00135196
• Citation:
  Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, ECTB 115-28a, 1984 Jul; :1-31
• CAS Registry Number:
  Phosphine (PH3) (CAS RN 7803-51-2) ; Silicon tetrafluoride (CAS RN 7783-61-1)
• Federal Fiscal Year:
  1984
• Peer Reviewed:
  False
• NAICS and SIC Codes:
  3674 - Semiconductors and related devices - (SIC)
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:8335f11762d58c161a856925c78afeae1c4dd27fd3e7b6132c6d312f3dfaf87680ccc18668b6af7b2f3aa95686256529521c4de24bc558bcc28497b0ea9d8c04
• Download URL:
  https://stacks.cdc.gov/view/cdc/179673/cdc_179673_DS1.pdf
• File Type:
  [PDF - 1.22 MB ]