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Description:A walk through survey of the integrated circuit fabrication operation at Honeywell Optoelectronics Division (SIC-3674), Richardson, Texas, was conducted in December, 1981. Engineering controls consisted of general and local ventilation, and isolation enclosure of the epitaxy and gas cylinder storage areas. The gas storage room was maintained at a slight negative pressure. Gas monitoring was conducted by the company. Liquid wastes were segregated according to type. Acidic wastes were pumped to a drain that carried them to a waste treatment system where they were neutralized with sodium-hydroxide. Organic wastes were placed in containers which were taken to an outdoor area behind the facility where they were emptied into drums for disposal. The facility had no routine industrial hygiene program. Smocks, gloves, and safety glasses were required in all fabrication areas. Respirators were available in case of emergency. Preplacement medical examinations were not administered. Quarterly urinalyses for arsenic (7440382) exposure were conducted on all employees performing sawing operations. The authors recommend that an industrial hygiene consultant be retained. A detailed industrial hygiene survey is not recommended because the facility uses processes that are different from those used in typical silicon wafer production.
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Pages in Document:1-13
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NIOSHTIC Number:nn:00135193
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Citation:Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, ECTB 115-17a, 1984 Jul; :1-13
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Federal Fiscal Year:1984
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Peer Reviewed:False
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