Preliminary control technology survey on Comdial Semiconductor, Inc., Sunnyvale, California.

Details

• Personal Author:
  Mihlan GJ ; Willson, Robert D.
• Description:
  A preliminary control technology assessment survey was conducted at Comdial Semiconductor, Incorporated (SIC-3674) in Sunnyvale, California on January 12, 1982. Production areas, gas and chemical storage areas, waste storage areas, and wafer testing and assembly areas were surveyed. Chemical storage, gas handling, monitoring and ventilation systems, and the waste management system were assessed. Gas detector tubes were used for testing of gas cylinder leaks and ventilation system measurements were made by facility engineering personnel. No medical personnel were employed and physical examinations were not required. The authors recommend that the gas jungle for the diffusion furnace assembly be enclosed and vented and that manual shutoff valves be made accessible. The low pressure chemical vapor deposition source cabinet should be covered with a plastic shield to improve capture of gas leaks. Ventilation is needed for diffusion furnace source cabinets. Gas lines should be purged using nitrogen cylinders rather than house nitrogen. Lower phosphine (7803512) concentrations should be considered. A less toxic degreasing agent should be substituted for trichloroethylene (79016). The combustible gas detector should be routinely calibrated and a monitoring alarm system should be installed along with a phosphine monitoring system. [Description provided by NIOSH]
• Subjects:
  Occupational Health Personal Protective Equipment Preceptorship Respiratory Protective Devices Safety Ventilation Workplace
• Keywords:
  NIOSH-Author; NIOSH-Survey; Ventilation; Field-Study; Gas-detectors; Workplace-studies; Industrial-hygiene; Respiratory-protective-equipment; Control-technology; Region-9
• Series:
  Engineering and Physical Hazards Survey Reports
• Publisher:
  National Institute for Occupational Safety and Health
• Document Type:
  Text
• Genre:
  Field Study ; Standards
• Place as Subject:
  California ; Ohio ; OSHA Region 5 ; OSHA Region 9
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Division:
  DPSE - Division of Physical Sciences and Engineering
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Pages in Document:
  1-24
• NIOSHTIC Number:
  nn:00132357
• NTIS Accession Number:
  PB84183052
• Citation:
  Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, ECTB 115-23a, 1983 Aug; :1-24
• CAS Registry Number:
  Phosphine (PH3) (CAS RN 7803-51-2) ; Trichloroethylene (CAS RN 79-01-6)
• Federal Fiscal Year:
  1983
• Peer Reviewed:
  False
• NAICS and SIC Codes:
  3674 - Semiconductors and related devices - (SIC)
• Source Full Name:
  National Institute for Occupational Safety and Health
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:d3a6a924ca2bb65564fb516d91751af41383abbc04f802022c488fcd6ee5a12777bec2cc66b545618b8260d8e45de6fe60d4c302796ac146d2b9552542550d0a
• Download URL:
  https://stacks.cdc.gov/view/cdc/233758/cdc_233758_DS1.pdf
• File Type:
  [PDF - 1.04 MB ]