Exposure Assessment for Retrospective Follow-Up Studies of Semiconductor- and Storage Device-Manufacturing Workers
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2005/10/01
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Details
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Personal Author:Beall C ; Bender T ; Blicharz D ; Cheng H ; Delzell E ; Herrick, Robert F. ; Matthews R ; Sathiakumar N ; Stewart JH
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Description:OBJECTIVE: This exposure assessment was conducted in the first large study of mortality and cancer incidence in semiconductor and storage device manufacturing. METHODS: Unique combinations of division, department and job codes and names (DDJ) from work history records were assigned to work groups and exposure categories. Agent exposure matrices assessed differences in potential exposures between groups. Changes in exposure over time were tracked by dividing the production history into manufacturing eras. RESULTS: Nineteen work groups were developed to capture 310,351 unique DDJs from 1965-1999. Agent exposure matrices contrasted exposure potential to solvents, metals, and work in cleanrooms between groups, and three manufacturing eras were identified for each site. CONCLUSIONS: The work groups, manufacturing eras and agent matrices have been used to classify workers in the study of cancer incidence and mortality. Erratum in: J Occup Environ Med. 2005 Dec; 47(12):1319. Table 4 replaced. [Description provided by NIOSH]
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ISSN:1076-2752
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Volume:47
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Issue:10
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NIOSHTIC Number:nn:20056889
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Citation:J Occup Environ Med 2005 Oct; 47(10):983-995
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Contact Point Address:Dr Robert F. Herrick, 401 Park Drive, Landmark Center, Harvard School of Public Health, Boston, MA 02215
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Email:Herrick@hohp.harvard.edu
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Federal Fiscal Year:2006
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Performing Organization:University of North Carolina, Chapel Hill
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Peer Reviewed:True
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Start Date:20050701
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Source Full Name:Journal of Occupational and Environmental Medicine
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End Date:20270630
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Main Document Checksum:urn:sha-512:3ac1b78cf4331961b480e703b3e00d15366505ef3638b5f1a96836ea8503c2f3d98a5c9ce4c2d79f30fbd03b89036d8481ac129df100f8b99dc588d7bf692175
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