Prospectively assessed menstrual cycle characteristics in female wafer-fabrication and nonfabrication semiconductor employees

Details

• Personal Author:
  Eskenazi B ; Gold EB ; Hammond SK ; Hines CJ ; Lasley BL ; Overstreet JW ; Rasor MO ; Samuels SJ ; Schenker MB
• Description:
  The possibility of increased risk of spontaneous abortion (SAB) was examined among women working in the semiconductor industry, particularly those employed in the fabrication (fab) rooms. Baseline demographic factors that might affect menstrual cycle characteristics were compared for 152 fab and 250 nonfab workers. Diaries showed a slightly higher mean cycle length (MCL) per woman in fab than nonfab workers, but this was not a statistically significant difference. The thin film and ion implantation (TFII) and photolithography (PHOTO) groups had significantly higher logarithmic transformation of the mean standard deviation in cycle length (MLSD) than nonfab workers. The significantly higher MCL and MLSD in TFII workers are consistent with the reduced probability of conception seen in the dopants and thin films super group composed of the furnace and TFII work groups. The proportion of women with any short or long cycles was slightly higher in fab than nonfab workers. Women exclusively assigned to the etching group were the only fab workers whose risk of any long cycles was higher than that among all nonfab women. The risk of all cycles being long was highest among TFII workers. The adjusted relative risk for having any short cycles by the fourth cycle was highest among supervisors/engineers. The adjusted relative risk for PHOTO workers was almost double that of nonfab workers. Levels of ethylene based glycol ethers or fluoride exposure did not appear to affect any of the five menstrual cycle outcomes. [Description provided by NIOSH]
• Subjects:
  Epidemiology Occupational Exposure Occupational Health Risk Assessment Risk Factors Safety Semiconductors Urogenital Diseases Urogenital System
• Keywords:
  Author Keywords: Menstrual Cycle Humans Occupational-exposure Occupational Exposures Reproduction Reproductive-hazards Reproductive-system-disorders Risk-factors Risk Factors Semiconductor Manufacturing
• ISSN:
  0271-3586
• Document Type:
  Text
• Funding:
  Cooperative Agreement
• Genre:
  Journal Article
• Place as Subject:
  California ; OSHA Region 9
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Volume:
  28
• Issue:
  6
• NIOSHTIC Number:
  nn:00230988
• Citation:
  Am J Ind Med 1995 Dec; 28(6):799-815
• Federal Fiscal Year:
  1996
• Performing Organization:
  University of California - Davis
• Peer Reviewed:
  True
• Start Date:
  19900930
• Source Full Name:
  American Journal of Industrial Medicine
• End Date:
  20020929
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:ce5be8688299b3cf1d3e8db5b643d966af4baca4d4e24f93e66c630e2b4054c247684135c65157b4826ec392062580227de388eea0f02c2140dfba1089f61cbb
• Download URL:
  https://stacks.cdc.gov/view/cdc/205418/cdc_205418_DS1.pdf
• File Type:
  [PDF - 1.03 MB ]