Preliminary survey report: control technology for gallium arsenide processing at Hewlett Packard, San Jose, California.

Details

• Personal Author:
  Lenihan KL
• Description:
  A walk through survey of the Hewlett Packard Company (SIC-3674) facility in San Jose, California, was prompted by an interest in the use of gallium-arsenide (1303000) as an alternative to silicon for the semiconductor industry. This facility produced gallium-arsenide and gallium-phosphide (12063988). Potential hazards existed from solvents, acids, and gases employed in wafer production. Some of the solvents included fluorocarbon compounds, xylene (1330207), and 1,1,1-trichloroethane (25323891). Arsine (7784421), phosphine (7803512), hydrogen (1333740), and silane (7803625) gases were used in the production processes. In the crystal growing area, operators wore smocks, disposable gloves and safety glasses. Disposable respirators were no longer required during cleaning of the crystal pullers. However, supplied air lines were required during the gas cylinder change operation. Self contained breathing apparatus was available for emergency situations. Worker exposures to gallium- arsenide or arsenic (7440382) dust were lower during the cleaning operation than they had been in other similar facilities, perhaps due to the small size of the crystal pullers used at this particular facility. According to the author, this facility is a possible candidate for an in depth industry survey, but may not be representative of the entire industry.
• Subjects:
  Accidents, Occupational Dust Hazardous Substances Manufacturing And Industrial Facilities Mining Musculoskeletal Diseases Occupational Health Safety
• Keywords:
  Arsenic-compounds Field-Study NIOSH-Author NIOSH-Survey Organic-solvents Region-9 Semiconductors Toxic-gases Toxic-vapors
• DOI:
  https://doi.org/10.26616/NIOSHECTB16314a
• Publisher:
  National Institute for Occupational Safety and Health
• Document Type:
  Text
• Genre:
  Field Studies ; Control Technology
• Place as Subject:
  California ; Ohio ; OSHA Region 5 ; OSHA Region 9
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Division:
  DPSE - Division of Physical Sciences and Engineering
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Pages in Document:
  1-9
• NIOSHTIC Number:
  nn:00169480
• Citation:
  Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, ECTB 163-14a, 1987 Apr; :1-9
• CAS Registry Number:
  Gallium arsenide (CAS RN 1303-00-0) ; Gallium phosphide (CAS RN 12063-98-8) ; Xylene (CAS RN 1330-20-7) ; Trichloroethane (CAS RN 25323-89-1) ; Arsine (CAS RN 7784-42-1) ; Phosphine (PH3) (CAS RN 7803-51-2) ; Hydrogen (CAS RN 1333-74-0) ; Silane (CAS RN 7803-62-5) ; Arsenic (CAS RN 7440-38-2)
• Federal Fiscal Year:
  1987
• Peer Reviewed:
  False
• NAICS and SIC Codes:
  3674 - Semiconductors and related devices - (SIC)
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:c17173966b470957c67c730ecf0f609dca49e364447a14fa959fd9d01c94efb205a31c880d4e7cb6852119c794052135f2e2b9386d2e01f71ee300c931a504f7
• Download URL:
  https://stacks.cdc.gov/view/cdc/179946/cdc_179946_DS1.pdf
• File Type:
  [PDF - 381.96 KB ]