Preliminary control technology survey of INMOS Corporation, Colorado Springs, Colorado.

Details

• Personal Author:
  Mihlan GJ ; Willson RD
• Description:
  A walk through survey was conducted at INMOS Corporation (SIC-3674), Colorado Springs, Colorado on October 13, 1981 to evaluate control technology for integrated circuit fabrication. Operations performed at the facility included thermal oxidation; photolithographic processes; wet chemical cleaning and etching; plasma etching; chemical vapor deposition of silicon-dioxide (14808607), silicon- nitride (12033895), and polycrystalline-silicon (7440213); diffusion; ion implantation; metalization by radiofrequency sputtering; and hydrogen annealing. Engineering controls varied by process operation and included isolation, local exhaust ventilation, shielding, and enclosure, and process substitution. Microprocessors were used to control process equipment for several operations. Continuous area monitoring for arsine (7784421) and phosphine (7803512) was performed by infrared spectrophotometry. X-ray radiation emissions were monitored with radiation film badges. Personal protective equipment varied by job functions and included safety goggles or glasses, acid resistant shielding, and respirators. The authors conclude that the facility represents the current state of the art in clean room design using a tunnel bay layout. Specific observations and recommendations regarding the effectiveness of control technology at the facility pertain to air circulation, waste management, and valves on gas lines from cylinders containing flammable, toxic, or corrosive gases.
• Subjects:
  Accidents, Occupational Occupational Health Petroleum Preceptorship Safety
• Keywords:
  Air-quality-monitoring Control-technology Electronics-industry Field-Study Industrial-hygiene-programs Laboratory-workers NIOSH-Author NIOSH-Survey Region-8 Safety-engineering Safety-equipment Work-environment

  More +
• Document Type:
  Text
• Place as Subject:
  Colorado ; Ohio ; OSHA Region 5 ; OSHA Region 8
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Division:
  DPSE - Division of Physical Sciences and Engineering
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Pages in Document:
  1-30
• NIOSHTIC Number:
  nn:00133455
• Citation:
  NIOSH 1983 Oct; :1-30
• CAS Registry Number:
  Quartz (SiO2) (CAS RN 14808-60-7) ; Trisilicon tetranitride (CAS RN 12033-89-5) ; Silicon (CAS RN 7440-21-3) ; Arsine (CAS RN 7784-42-1) ; Phosphine (PH3) (CAS RN 7803-51-2)
• Federal Fiscal Year:
  1984
• NORA Priority Area:
  Control Technology and Personal Protective Equipment ; Research Tools and Approaches ; Control Technology
• Peer Reviewed:
  False
• NAICS and SIC Codes:
  3674 - Semiconductors and related devices - (SIC)
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:01e6d8d6ab4f0867d425c7db9924058cc5c01f77aaee70ee23e0e645714ce2debe43ee127ab1195eb19525ad6f0aac267f0a6b572f242826986b11818052f3e6
• Download URL:
  https://stacks.cdc.gov/view/cdc/179572/cdc_179572_DS1.pdf
• File Type:
  [PDF - 1.31 MB ]