Preliminary industrial hygiene survey report, Texas Instruments, Dallas, Texas.
Public Domain
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1983/03/07
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Description:A preliminary control technology survey was conducted at Texas Instruments (SIC-3674), Dallas, Texas, on December 8, 1981. The study was part of a control technology assessment for the electronic component industry. The facility's production areas, gas and chemical storage areas, air handling systems, and waste management facilities were surveyed. The facility employed between 400 and 800 workers of whom about 66 percent were involved directly in device manufacturing. The preliminary survey focused on epitaxial growth, standard cleanup, diffusion and chemical vapor deposition, photolithography, and metallization. Vapor and gases emitted from process and storage areas were controlled by local exhaust ventilation. General ventilation was also provided in work areas. About 90 percent of the air was recirculated. The facility provided educational and training programs in areas of safety, materials handling, use of protective equipment, and emergency and hazard reporting procedures. The authors conclude that the work environment appeared to be well controlled. The technology was representative of that used in most semiconductor processes; however, the diffusion drive, arsenic doping process was advanced compared to an arsine gas doping process.
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Pages in Document:1-18
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NIOSHTIC Number:nn:00132134
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Citation:NIOSH 1983 Mar; :1-18
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Federal Fiscal Year:1983
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Peer Reviewed:False
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Main Document Checksum:urn:sha-512:9a0c97eadf5be6323df96e9273cfcd101095b1ed1c2ccbc9c7d65dad42e5984b37ee773ab279dcf89a2fb8ceabd497caff95c9c9796e305fc51f3aeb4c0ccf5e
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