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Development of a source-exposure matrix for occupational exposure assessment of electromagnetic fields in the INTEROCC study
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7 2017
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Source: J Expo Sci Environ Epidemiol. 27(4):398-408
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Alternative Title:J Expo Sci Environ Epidemiol
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Description:Introduction
To estimate occupational exposures to electromagnetic fields (EMF) for the INTEROCC study, a database of source-based measurements extracted from published and unpublished literature resources had been previously constructed. The aim of the current work was to summarize these measurements into a source-exposure matrix (SEM), accounting for their quality and relevance.
Methods
A novel methodology for combining available measurements was developed, based on order statistics and log-normal distribution characteristics. Arithmetic and geometric means, and estimates of variability and maximum exposure were calculated by EMF source, frequency band and dosimetry type. Mean estimates were weighted by our confidence on the pooled measurements.
Results
The SEM contains confidence-weighted mean and maximum estimates for 312 EMF exposure sources (from 0 Hz to 300 GHz). Operator position geometric mean electric field levels for RF sources ranged between 0.8 V/m (plasma etcher) and 320 V/m (RF sealer), while magnetic fields ranged from 0.02 A/m (speed radar) to 0.6 A/m (microwave heating). For ELF sources, electric fields ranged between 0.2 V/m (electric forklift) and 11,700 V/m (HVTL-hotsticks), while magnetic fields ranged between 0.14 μT (visual display terminals) and 17 μT (TIG welding).
Conclusion
The methodology developed allowed the construction of the first EMF-SEM and may be used to summarize similar exposure data for other physical or chemical agents.
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Pubmed ID:27827378
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Pubmed Central ID:PMC5573206
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