Semiconductor Industry - A Hazard Surveillance Perspective.

Details

• Personal Author:
  Seta, Joseph A. ; Sundin, David S.
• Description:
  Selected results of the National Occupational Exposure Survey (NOES) relevant to the semiconductor industry (SIC-3674) were presented. The NOES was a NIOSH survey of 1,800,000 employees in 523 industries and 410 occupations and was designed to allow the data to be extrapolated to the national level. In the semiconductor industry, surveys were conducted at 14 facilities employing 56,092 workers to obtain profiles on the health and safety practices, the distribution of potential exposures, and control methods used to reduce the exposures. Sixty four percent of the semiconductor facilities had a health unit versus 25 percent of the industries with different standard industrial codes (SICs). Semiconductor facilities with fewer than 500 employees did almost no environmental monitoring. However, environmental monitoring by semiconductor facilities employing more than 500 employees was considered better than similar sized industries in other SIC categories. All semiconductor facilities required or recommended that their employees used personal protective equipment. Ninety eight workers in the facilities were identified as being potentially exposed to arsenic (7440382). All received preplacement physical examinations and 32 percent received physical examinations when they returned to work after an illness. The potential exposures to arsenic were controlled by using personal protective equipment, ventilation, isolation, or administrative procedures. Personal protective clothing, ventilation, or administrative controls were used to control exposures to other agents such as silica (14808607), ammonia (7664417), nitric-acid (7697372), phosphoric-acid (7664382), sulfuric-acid (7664939), or trichloroethylene (79016). Possible applications of the NOES data were discussed. These include linking the data to data contained in the Registry of Toxic Effects of Chemical Substances and linking potential occupational exposure agents to specific occupations and industries by means of the three dimensional Job Exposure Matrix, which was developed by NIOSH. [Description provided by NIOSH]
• Subjects:
  Epidemiology Occupational Exposure Occupational Health Safety
• Keywords:
  Electronics-industry; Occupational-hazards; Epidemiology; Occupational-exposure; Industrial-hygiene; Control-methods; Health-protection; Information-systems
• Document Type:
  Text
• Genre:
  Proceedings
• Place as Subject:
  Michigan ; OSHA Region 5
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Pages in Document:
  37-46
• NIOSHTIC Number:
  nn:00189545
• Citation:
  Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan 1989:37-46
• CAS Registry Number:
  Ammonia (CAS RN 7664-41-7) ; Arsenic (CAS RN 7440-38-2) ; Nitric acid (CAS RN 7697-37-2) ; Phosphoric acid (CAS RN 7664-38-2) ; Quartz (SiO2) (CAS RN 14808-60-7) ; Sulfuric acid (CAS RN 7664-93-9) ; Trichloroethylene (CAS RN 79-01-6)
• Federal Fiscal Year:
  1989
• Peer Reviewed:
  False
• NAICS and SIC Codes:
  3674 - Semiconductors and related devices - (SIC)
• Source Full Name:
  Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:7dc847c09aedf140bc731323e8446b4703641ae07d6ad9e7b7238120dab30b8f7dcaa9b938d34d035f87873a0fe7fec262d5d13dcaf290925445e82b6de3b57d
• Download URL:
  https://stacks.cdc.gov/view/cdc/242852/cdc_242852_DS1.pdf
• File Type:
  [PDF - 168.02 KB ]