Summary of Occupational Injuries and Illnesses in the Semiconductor Industry for 1980-1985.
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1989/01/01
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Description:An analysis of occupational illnesses and injuries occurring in the semiconductor industry (SIC-3674) during the period 1980 through 1985 was performed. The Bureau of Labor Statistics (BLS) Annual Reports of Occupational Injuries and Illnesses in the United States for 1980 through 1985 and the data from the BLS Supplementary Data System for 1983 were examined. The combined incidence rates of injury and illness in the semiconductor industry for 1980, 1981, 1982, 1983, 1984, and 1985 were 5.5, 4.6, 3.8, 4.2, 4.1, and 4.9 cases per 100 fulltime workers, respectively. The combined incidence rates for each year of the study period were less than those for all manufacturing and private industry as well as for total electronic component and accessory manufacturing. The incidence rates of illness in semiconductor manufacturing decreased from 0.6/100 in 1980 to 0.4/100 in 1981 and 1982 and 0.2/100 in 1983 and then increased to 0.4/100 in 1984 and 1985. These rates were greater than those for all manufacturing industries in 1980 and 1982, equal in 1981, 1984, and 1985, and lower in 1983. In 1984 the rate of illness among semiconductor industrial workers was due primarily to respiratory conditions due to exposure to toxic agents. In 1985 the rate was due to skin disorders and respiratory conditions due to toxic agents. Fifty five percent of the total injury and illness reported occurred to female workers and 56 percent occurred in the occupational category operators and laborers. Sixty percent of the injuries or illnesses resulted from overexertion, contact with stationary objects, and falls. Approximately 67 percent of the total injury and illness incidence was due to sprains, strains, cuts and lacerations. Forty percent of all illnesses were systemic poisonings. The authors note that more detailed studies are needed to identify processes and exposures responsible for the reported cases. These would make it possible to develop control methods to better protect the workers. [Description provided by NIOSH]
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Pages in Document:3-16
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NIOSHTIC Number:nn:00189544
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Citation:Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan 1989:3-16
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Federal Fiscal Year:1989
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Peer Reviewed:False
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Source Full Name:Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan
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Main Document Checksum:urn:sha-512:7dc847c09aedf140bc731323e8446b4703641ae07d6ad9e7b7238120dab30b8f7dcaa9b938d34d035f87873a0fe7fec262d5d13dcaf290925445e82b6de3b57d
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