Continuous monitoring to detect episodic releases of toxic gases.

Details

• Personal Author:
  Fluer L ; Urmson J ; Yakubek P ; Fluer L ; Urmson J ; Yakubek P
• Description:
  This chapter reviewed efforts to control substances classified as either toxic or highly toxic and to determine the presence of such materials in accidental release. A forerunner in the development of controls surrounding the storage and use of hazardous materials by industry was the Uniform Fire Code. A broad based position of that Code is known as Article 80, Hazardous Materials. The accidental release of toxic gas would present a risk to the general public and the user. Cylinders as well as portable and stationary tanks of toxic gases used in industry required either local or general exhausting from the building. These exhaust systems as well as work areas must then be monitored by continuous gas detection equipment. Article 80 was concerned with all industrial facilities which use toxic or highly toxic compressed gases, and, in particular, with the accidental release of such substances. Differences between the permissible exposure levels over work periods and those peak levels attained during emergency situations were discussed. Monitoring was considered to be an essential part of the implementation of the provisions of the Article. Examples of chemical substances with low lethal doses for humans were listed, along with their classification under Article 80 and their threshold limit values. Control methods which apply to these and other toxic materials were reviewed, including substitution of a less hazardous material, quantity and concentration reductions, reductions of flow rates, and reductions of flow times. Several other safeguards which are applicable only to the semiconductor industry were noted. [Description provided by NIOSH]
• Subjects:
  Accident Prevention Accidents Hazardous Substances Occupational Health Safety Semiconductors
• Keywords:
  Electronics-industry; Safety-practices; Toxic-gases; Accident-prevention; Control-technology; Compressed-gases; Control-methods; Hazardous-materials; Semiconductors
• Publisher:
  Lewis Publishers, Inc.
• Document Type:
  Text
• Genre:
  Proceedings ; Proceedings
• Place as Subject:
  Michigan ; OSHA Region 5
• CIO:
  National Institute for Occupational Safety and Health (NIOSH) ; National Institute for Occupational Safety and Health (NIOSH)
• Topic:
  Workplace Safety & Health ; Workplace Safety & Health
• Location:
  North America ; North America
• Pages in Document:
  135-148
• NIOSHTIC Number:
  nn:00189062
• Citation:
  Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan 1989:135-148
• Federal Fiscal Year:
  1989
• NORA Priority Area:
  Research Tools and Approaches: Control Technology and Personal Protective Equipment ; Research Tools and Approaches: Control Technology and Personal Protective Equipment
• Peer Reviewed:
  False
• Source Full Name:
  Hazard Assessment and Control Technology in Semiconductor Manufacturing, Lewis Publishers, Inc., Chelsea, Michigan
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:7dc847c09aedf140bc731323e8446b4703641ae07d6ad9e7b7238120dab30b8f7dcaa9b938d34d035f87873a0fe7fec262d5d13dcaf290925445e82b6de3b57d
• Download URL:
  https://stacks.cdc.gov/view/cdc/242834/cdc_242834_DS1.pdf
• File Type:
  [PDF - 168.02 KB ]