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Characterizing Exposures from N-Free Nail Polishes

Public Domain


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  • Personal Author:
  • Description:
    Nail polishes contain many chemical compounds, including chemicals which can cause adverse reproductive outcomes and pose a risk to the high proportion (96%) of nail salon workers who are women of childbearing age. Consumer demand has resulted in a shift towards more natural products (n-free products), with manufacturers attempting to remove harmful ingredients. Many products that claim to have eliminated toluene, formaldehyde, and dibutyl phthalate (DBP) are labeled as 3-free; however, studies have found these products often contain higher concentrations of toluene and DBP compared to products with no such claims. Products used only at salons are not required to list ingredients, leading to uncertainties as to the exact chemical composition and potential for worker exposures. A better understanding of chemical exposures associated with nail polish products is necessary to understand potential worker exposures and develop effective control options. This study evaluated chemical exposures generated while painting nails with ten brands of n-free polishes using real-time and time-integrated (average) air sampling. Twenty-five individual compounds (FTIR, Gasmet Inc) were measured in the breathing zone while two coats of polish were applied to artificial nails on a manikin in an exposure chamber and for two hours afterwards. Average concentrations of DBP (OVS tubes, SKC) and triphenyl phosphate (TPhP, mixed cellulose ester filters, SKC) were measured. Formaldehyde and toluene were detected in all polishes despite all claiming to be 3-free. Average and peak real-time formaldehyde exposures ranged from 0.004 to 0.16 ppm and from 0.18 to 1.19 ppm, respectively, depending on polish brand. Formaldehyde exposures for 95% of the brands exceeded the NIOSH REL of 0.1 ppm. Average real-time toluene exposures ranged from 0.001 to 0.67 ppm, well below the NIOSH REL. Neither DBP nor TPhP were detected in any of the polishes. This study highlights that despite industry claims, n-free polishes may still contain chemicals associated with negative health effects and that more studies are necessary to understand the true chemical exposures of nail salon workers. [Description provided by NIOSH]
  • Subjects:
  • Keywords:
  • ISSN:
    2472-1727
  • Document Type:
  • Genre:
  • Place as Subject:
  • CIO:
  • Division:
  • Topic:
  • Location:
  • Volume:
    115
  • Issue:
    8
  • NIOSHTIC Number:
    nn:20068668
  • Citation:
    Birth Defects Res 2023 May; 115(8):871
  • CAS Registry Number:
  • Federal Fiscal Year:
    2023
  • NORA Priority Area:
  • Peer Reviewed:
    False
  • Source Full Name:
    Birth Defects Research. Society for Birth Defects Research and Prevention 63rd Annual Meeting: Improving Pregnancy Outcomes through Collaborative Research, June 24-28, 2023, Charleston, South Carolina
  • Collection(s):
  • Main Document Checksum:
    urn:sha-512:d9930b74600e79c77a6050b1828b2e81cf88d0af02a59f02cfe89801cb0a0e18c5fc39c11bc8702f464fdf22675be63c6408c91c56d188cf06155a2a219d063c
  • Download URL:
  • File Type:
    Filetype[PDF - 1.48 MB ]
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