SEM analysis of particle size during conventional treatment of CMP process wastewater

Details

• Personal Author:
  Brenner SA ; Neu-Baker NM ; Roth GA
• Description:
  Engineered nanomaterials (ENMs) are currently employed by many industries and have different physical and chemical properties from their bulk counterparts that may confer different toxicity. Nanoparticles used or generated in semiconductor manufacturing have the potential to enter the municipal waste stream via wastewater and their ultimate fate in the ecosystem is currently unknown. This study investigates the fate of ENMs used in chemical mechanical planarization (CMP), a polishing process repeatedly utilized in semiconductor manufacturing. Wastewater sampling was conducted throughout the wastewater treatment (WWT) process at the fabrication plant's on-site wastewater treatment facility. The goal of this study was to assess whether the WWT processes resulted in size-dependent filtration of particles in the nanoscale regime by analyzing samples using scanning electron microscopy (SEM). Statistical analysis demonstrated no significant differences in particle size between sampling points, indicating low or no selectivity ofWWT methods for nanoparticles based on size. All nanoparticles appeared to be of similarmorphology (near-spherical), with a high variability in particle size. EDX verified nanoparticles composition of silicon- and/or aluminum-oxide. Nanoparticle sizing data compared between sampling points, including the final sampling point before discharge from the facility, suggested that nanoparticles could be released to the municipal waste stream from industrial sources. [Description provided by NIOSH]
• Subjects:
  Chemistry Filtration Occupational Health Particulate Matter Safety Semiconductors Silicon Compounds Waste Management
• Keywords:
  Aluminum-oxides Author Keywords: Chemical Mechanical Planarization Chemical-properties Morphology Nanoparticle Nanotechnology Particulates Physical-properties Sampling Scanning Electron Microscopy Silicon-compounds Statistical-analysis Waste-disposal-systems Wastewater Treatment

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• ISSN:
  0048-9697
• Document Type:
  Text
• Funding:
  Grant
• Genre:
  Journal Article
• Place as Subject:
  New York ; OSHA Region 2
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Pages in Document:
  1-6
• Volume:
  508
• NIOSHTIC Number:
  nn:20045884
• Citation:
  Sci Total Environ 2015 Mar; 508:1-6
• Contact Point Address:
  Sara A. Brenner, State University of New York (SUNY) Polytechnic Institute, College of Nanoscale Science, Nanobioscience Constellation, 257 Fuller Road, Albany, NY 12203
• Email:
  sbrenner@sunycnse.com
• CAS Registry Number:
  Silicon (CAS RN 7440-21-3)
• Federal Fiscal Year:
  2015
• Performing Organization:
  State University of New York at Albany
• Peer Reviewed:
  True
• Start Date:
  20120901
• Source Full Name:
  Science of the Total Environment
• End Date:
  20150828
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:38a03a2115ba497d0f754d1ea4492b222326c185971eb6204b9bcfb5ec1b70e022dbedf7a8ad87b1729f277faaf3e183978d27139225abed27c4f425e64d209e
• Download URL:
  https://stacks.cdc.gov/view/cdc/201133/cdc_201133_DS1.pdf
• File Type:
  [PDF - 2.40 MB ]