Personal Fluoride and Solvent Exposures, and Their Determinants, in Semiconductor Manufacturing

Details

• Personal Author:
  Hallock MF ; Hammond SK ; Hines CJ ; Kenyon E ; Schenker MB ; Woskie SR
• Description:
  Personal air sampling for fluorides and solvents was done at 35 semiconductor fabrication facilities in the United States. Fluoride compounds were used in etching and cleaning operations, and solvents were used in photoresist and developing operations. All personal solvent and fluoride levels were less than 2 percent of current Occupational Safety and Health Administration (OSHA) standards. Statistical models of the exposure determinants for the target agents found production level, as indicated by number of semiconductor wafer cassettes loaded/unloaded from the target machines or baths, was predictive of fluoride, xylene and 1-methoxy-2-propyl acetate exposures. The percent of fresh air ventilation and the percent of xylene in the photoresist were also significant determinants in the statistical model predicting personal xylene exposure levels. [Description provided by NIOSH]
• Subjects:
  Air Pollution Chemistry Environmental Exposure Environmental Monitoring Fluorides Glycols Occupational Health Safety Semiconductors Solvents Ventilation Xylenes

  More +
• Keywords:
  Air Purification Air Quality Air Samples Air Sampling Author Keywords: Semiconductor Manufacturing Chemical Analysis Chemical Exposures Cleaning Compounds Exposure Assessment Exposure Determinants Exposure Levels Exposure Limits Fluoride Fluoride Compounds Glycol Ethers Models Statistical Analysis

  More +
• ISSN:
  1047-322X
• Document Type:
  Text
• Funding:
  Cooperative Agreement
• Genre:
  Journal Article
• Place as Subject:
  California ; Massachusetts ; Ohio ; OSHA Region 1 ; OSHA Region 5 ; OSHA Region 9
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Division:
  DSHEFS - Division of Surveillance, Hazard Evaluations, and Field Studies
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Pages in Document:
  354-361
• Volume:
  15
• Issue:
  4
• NIOSHTIC Number:
  nn:20020864
• Citation:
  Appl Occup Environ Hyg 2000 Apr; 15(4):354-361
• CAS Registry Number:
  Xylene (CAS RN 1330-20-7)
• Federal Fiscal Year:
  2000
• Performing Organization:
  University of California - Davis
• Peer Reviewed:
  True
• Start Date:
  19900930
• Source Full Name:
  Applied Occupational and Environmental Hygiene
• End Date:
  20020929
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:d6a185e75b1212742af8ad42eec41287d01f933e639bbb3f104fdb1036903121c500a8492145b504284bc2e5f542cbeff2f591107262f2ab015c1dddc515ed65
• Download URL:
  https://stacks.cdc.gov/view/cdc/198522/cdc_198522_DS1.pdf
• File Type:
  [PDF - 334.92 KB ]