Personal PID chemical sensor coupled with a real-time location system to create a novel direct-reading exposure assessment method

Details

• Personal Author:
  Brandes AR ; Brown KK ; Kovein, Ronald J. ; Mead, Kenneth R. ; Shaw, Peter B. ; Voorhees RT
• Description:
  A novel direct-reading method was developed using a commercial Real-Time Location System (RTLS) and a custom-built photoionization detector (PID) to monitor workplace exposures to gases and vapors. The resulting wireless personal chemical vapor monitor was designed by researchers at the University of Cincinnati, built by MeasureNet Technology, and interfaced to an Ubisense RTLS package using custom software. The system was tested for accuracy and precision in a 5000 square foot work area providing eight simultaneous exposure measurements: location in the X, Y, Z coordinate planes, isobutylene gas concentration, humidity, temperature, time, and sensor identification. A workplace chemical release was simulated and exposure assessed using the CEMWIP method. The personal PID was remotely tracked in real-time on floor plans, measuring instantaneous location and concentration of the contaminant, and the collected data were plotted in a "four-dimensional dose map". This enabled visualization of location and concentrations for exposure assessment purposes. [Description provided by NIOSH]
• Subjects:
  Electrical Equipment And Supplies Environmental Exposure Environmental Monitoring Occupational Health Safety Software Solvents Volatilization Workplace
• Keywords:
  Chemical-agent-detectors Computer-software Detectors Electronic-circuits Electronic-devices Electronic-equipment Environmental-exposure Environmental-technology Equipment-design Equipment-reliability Exposure-assessment Exposure-methods Gas-detectors Gases Ionization Measurement-equipment Monitoring-systems Monitors Photographic-equipment Vapor-detectors Vapors Workplace-monitoring

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• ISSN:
  0065-7727
• Publisher:
  American Chemical Society
• Document Type:
  Text
• Genre:
  Abstract or Summary
• Place as Subject:
  Indiana ; Ohio ; OSHA Region 5
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Division:
  DART - Division of Applied Research and Technology
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Volume:
  246
• NIOSHTIC Number:
  nn:20043750
• Citation:
  246th National Meeting of the American Chemical Society, September 8-12, 2013, Indianapolis, Indiana. Washington, DC: American Chemical Society, 2013 Sep; 246:104-ENVR
• Contact Point Address:
  Kenneth K. Brown, NIOSH, Div Appl Res & Technol, Chem Exposure Monitoring Branch, Cincinnati, OH 45226 USA
• Email:
  krb1@cdc.gov
• Federal Fiscal Year:
  2013
• Peer Reviewed:
  False
• Source Full Name:
  246th National Meeting of the American Chemical Society, September 8-12, 2013, Indianapolis, Indiana
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:7676304ada5af85b24f47e2c4f9ff6194a9e16355dd500f3ea29d063d6197df754f8f08eaeb00610d45eb969488a72f83676c8bf276050af9b3fba5fc096e091
• Download URL:
  https://stacks.cdc.gov/view/cdc/195571/cdc_195571_DS1.pdf
• File Type:
  [PDF - 16.64 KB ]