Industrial hygiene walk-through survey report of Dow Corning Corporation Semiconductor Plant, Hemlock, Michigan.
Public Domain
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1978/10/12
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By Willson RD
File Language:
English
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Description:Worker exposures to potentially hazardous physical and chemical agents were determined at the Dow Corning Corporation's semiconductor facility (SIC-3674) in Hemlock, Michigan, on September 6, 1978. The survey was part of a NIOSH health study of newly developing energy technologies. The company had access to an industrial hygiene staff. Signs of leakage of trichlorosilane (10025782) (TCS) were noted at the truck unloading area. Heavy accumulation of a white powder on the ceilings indicated the presence of airborne process materials. The author concludes that the operations at the facility may not be extensive enough to be representative of the photovoltaic cell industry. He recommends an industrial hygiene survey for the TCS unloading area, main production vessel rooms, the cleaning room, and for material recovery processes.
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Pages in Document:1-19
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NIOSHTIC Number:nn:00108660
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Citation:Cincinnati, OH: U.S. Department of Health, Education, and Welfare, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, IWS 68-22, 1978 Oct; :1-19
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Federal Fiscal Year:1979
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Performing Organization:PEDCo Environmental, Inc., Cincinnati, Ohio
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Peer Reviewed:False
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Main Document Checksum:urn:sha-512:e14f6e2fee013c2730141cd37e7b2bf492d2cee8c33bc87a010fc4ded6ba51af708129179003cdf3a2f46b7baf54e0f014931c27c261eae53a39773af77181ae
File Language:
English
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