Health Hazard Evaluation Report: HETA-81-319-1114: Inmos Corporation; Colorado Springs, Colorado

Details

• Personal Author:
  Gunter, Bobby J.
• Corporate Authors:
  National Institute for Occupational Safety and Health
• Description:
  The chemical and physical hazards present at a semiconductor facility, in Inmos Corporation (SIC-3674), Colorado Springs, Colorado, were investigated. The survey was performed in July, September, and October of 1981 at the request of the facility's management. Breathing zone and general room air samples were collected, radio frequency measurements performed, and noise levels assessed. All values for air samples of butyl-acetate (123864), cellosolve-acetate (111159), xylene (1330207), isopropanol (67630), hydrogen-fluoride (7664393), hydrochloric-acid (7647010), hydrogen- peroxide (7722841), arsenic (7440382), sulfuric-acid (7664939), crystalline silica (14808607), nitric-acid (7697372), phosphoric- acid (7664382), and total particulates were either below detection limits or well below evaluation criteria values. Radiofrequency measurements indicated that none of the workers was receiving any exposure. Noise exposures averaged less than 80 decibels. The evaluation criteria is 85 decibels. The author concludes that a health hazard due to chemical, radiofrequency, or noise exposure did not exist at the time of the survey.
• Subjects:
  Ear Electricity Environmental Exposure Environmental Monitoring Hydrogen Peroxide Manufacturing And Industrial Facilities Occupational Health Phosphoric Acids Radiation Safety Semiconductors Sense Organs Sulfuric Acids

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• Keywords:
  Air-quality-measurement Arsenic Cellosolve Acetate Crystalline Silica (quartz, Cristobalite, Total Particulate) Electrical-industry Electronic Components And Accessories/Semiconductors And Related Devices Hazards-Unconfirmed HETA-81-319-1114 Hydrochloric Acid Hydrogen Fluoride Hydrogen Peroxide Industrial-exposures Industrial-hazards Isopropanol NIOSH-Author NIOSH-Health-Hazard-Evaluation NIOSH-Technical-Assistance-Report Nitric Acid Noise OSHA Region 8 Phosphoric Acid Radiation-measurement Radiofrequency Semiconductor Plants Sulfuric Acid Xylene

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• Series:
  Health Hazard Evaluation Reports (HHE)
• Subseries:
  Health Evaluation and Technical Assistance (HETA)
• DOI:
  https://doi.org/10.26616/NIOSHHETA813191114
• Publisher:
  National Institute for Occupational Safety and Health
• Document Type:
  Text
• Genre:
  Field Study
• Place as Subject:
  Colorado ; OSHA Region 8
• CIO:
  National Institute for Occupational Safety and Health (NIOSH)
• Division:
  DSHEFS - Division of Surveillance, Hazard Evaluations, and Field Studies
• Topic:
  Workplace Safety & Health
• Location:
  North America
• Pages in Document:
  13 pdf pages
• Contributor:
  Stumpf, Jeffrey M.
• NIOSHTIC Number:
  nn:00127497
• NTIS Accession Number:
  PB84-140664
• Citation:
  Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, HETA 81-319-1114, 1982 May ; :1-22
• CAS Registry Number:
  n-Butyl acetate (CAS RN 123-86-4) ; 2-Ethoxyethyl acetate (CAS RN 111-15-9) ; Xylene (CAS RN 1330-20-7) ; Isopropyl alcohol (CAS RN 67-63-0) ; Hydrogen fluoride (CAS RN 7664-39-3) ; Hydrogen chloride (CAS RN 7647-01-0) ; Hydrogen peroxide (CAS RN 7722-84-1) ; Arsenic (CAS RN 7440-38-2) ; Sulfuric acid (CAS RN 7664-93-9) ; Silica, Crystalline (CAS RN 14808-60-7) ; Nitric acid (CAS RN 7697-37-2) ; Phosphoric acid (CAS RN 7664-38-2)
• Federal Fiscal Year:
  1982
• Peer Reviewed:
  False
• NAICS and SIC Codes:
  3674 - Semiconductors and related devices - (SIC)
• Collection(s):
  National Institute for Occupational Safety and Health
• Main Document Checksum:
  urn:sha-512:4366984fe8ca6b98d340693c7763eeadebd80763ef80aa0b14e32240c9d870be66d4d54965549fa6d38695eebd37d68998d7aef1620b57d7f7808d19c3417e23
• Download URL:
  https://stacks.cdc.gov/view/cdc/173107/cdc_173107_DS1.pdf
• File Type:
  [PDF - 2.26 MB ]