Health Hazard Evaluation Report: HETA-83-164-1377: Siemens Components, Inc.; Broomfield, Colorado
Public Domain
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1983/09/01
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English
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Description:In response to a request from the management of Siemens Components, Inc. (SIC-3674), Broomfield, Colorado, a semiconductor manufacturer, an evaluation was made of possible exposures to acids and organic solvents. Potential chemical exposures include hydrofluoric-acid (7664393), hydrochloric-acid (7647010, 1,1,1-trichloroethane (71556), nitric-acid (7697372), phosphoric-acid (7664382), acetic- acid (64197), sulfuric-acid (7664939), acetone (67641), methanol (67561), and ammonium-hydroxide (1336216) during the polishing and etching stages of the work. In the diffusion step employees risk exposure to hydrogen-peroxide (7722841), ammonium-hydroxide, Freon- 113 (76131), methylene-chloride (75092), nitric-acid, and hydrofluoric-acid. During the application of a photosensitive emulsion to the semiconductor wafer employees risk exposure to n- butyl-acetate (123864), hydrofluoric-acid, xylene (1330207), isopropyl-alcohol (67630), methyl-alcohol (67561), and hydrogen- peroxide. In the etching process exposure to potassium-hydroxide (1310583) and methyl-alcohol is possible. During the tin dip process exposures to Freon-113, methyl-alcohol, and isopropyl- alcohol may occur. No hazardous exposures to organic vapors or acid mists were found. The author concludes that there did not appear to be a health hazard due to overexposure to acid and organic vapors. One area did appear to have a cluster of health complaints
the author recommended that improvements be made in the engineering controls and work habits in this section of the facility. Exhaust ventilation should be installed in the solvent warehouse. Closed containers should be used in transferring degreasing solvents. An evaluation of the exhaust system in the tin dip area is recommended.
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Pages in Document:12 pdf pages
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NIOSHTIC Number:nn:00178914
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NTIS Accession Number:PB85-178754
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Citation:Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, HETA 83-164-1377, 1983 Sep ; :1-12
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CAS Registry Number:Hydrogen fluoride (CAS RN 7664-39-3) ; 1,1,1-Trichloroethane (CAS RN 71-55-6) ; Nitric acid (CAS RN 7697-37-2) ; Phosphoric acid (CAS RN 7664-38-2) ; Acetic acid (CAS RN 64-19-7) ; Sulfuric acid (CAS RN 7664-93-9) ; Acetone (CAS RN 67-64-1) ; Methanol (CAS RN 67-56-1) ; Ammonium hydroxide (CAS RN 1336-21-6) ; Hydrogen peroxide (CAS RN 7722-84-1) ; 1,1,2-Trichloro-1,2,2-trifluoroethane (CAS RN 76-13-1) ; Methylene chloride (CAS RN 75-09-2) ; n-Butyl acetate (CAS RN 123-86-4) ; Xylene (CAS RN 1330-20-7) ; Isopropyl alcohol (CAS RN 67-63-0) ; Potassium hydroxide (CAS RN 1310-58-3)
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Federal Fiscal Year:1983
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Peer Reviewed:False
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Main Document Checksum:urn:sha-512:0ea3146c155a442d7e0d891f5670f9b0f75d746753b14e869bb7a2e2f4c5e784b5a8a2d1f9a89f812f2b120c929daff5ac79deb3ca0c3691259024117cd3ed02
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English
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