Dioxin Registry Site Visit Report of Occidental Chemical Corporation, Hooker Chemical Center, Niagara Falls, New York
Public Domain
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1984/08/31
File Language:
English
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Journal Article:National Institute for Occupational Safety and Health
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Description:A walk-through survey of facilities of Occidental Chemical Corporation (SIC-2869), Niagara Falls, and Buffalo, New York was conducted in November, 1983 and February to March, 1984. The purpose of the survey was to obtain information on the manufacture of 2,4,5-trichlorophenol (95954) (TCP) and to determine if the workers should be included in the NIOSH 2,3,7,8- tetrachlorodibenzo(p)dioxin (1746016) (TCDD) registry. TCP was produced at the facility from the raw materials ethylene-glycol (107211), 1,2,4,5-tetrachlorobenzene (95943), and sodium-hydroxide (1310732) from 1949 through 1972. TCDD is a contaminant of TCP. The company maintained monthly and quarterly lists of all employees listed by job title from 1949 to 1978. Complete medical records were maintained only for workers who terminated or retired after 1967. The company had limited analytical data on TCDD concentrations in products, process streams, and residues. Such data showed maximum TCDD concentrations of 1.0 and 47 parts per million (ppm) in finished and crude product, respectively. TCDD concentrations in residues were 230 to 494ppm. The authors conclude that TCP production workers and repairmen in the fine chemicals department should be included in the NIOSH dioxin registry. [Description provided by NIOSH]
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Source:Cincinnati, OH: U.S. Department of Health and Human Services, Public Health Service, Centers for Disease Control, National Institute for Occupational Safety and Health, IWS 117-18, 1984 Aug; :1-32
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Pages in Document:38 pdf pages
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NIOSHTIC Number:nn:00145158
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NTIS Accession Number:PB85-221786
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Federal Fiscal Year:1984
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Peer Reviewed:False
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Main Document Checksum:urn:sha-512:d71dba349069119924f10b57367c708d4a5a22cab7c26cf82b1007d5b7b209126393d96715347ed7d7041a821ec1de142b078cc5fd8ebd729f8554790b540e63
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English
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